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Exam Code: C-TS411-2022 (Updated 60 Q&As)
Exam Name: SAP Certified Application Associate - SAP S/4HANA R&D Engineering
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NEW QUESTION: 1

A. Option D
B. Option C
C. Option B
D. Option A
Answer: D

NEW QUESTION: 2
At any given point of time, RPM can capture data for up to three baselines. When a fourth baseline is created, which baseline data are lost?
A. second baseline
B. third baseline
C. fourth baseline
D. first baseline
Answer: A

NEW QUESTION: 3
SAP Materials Managementのマテリアルマスターに基づいてアカウントの割り当てを決定する構成要素は何ですか?正しい答えを選んでください。応答:
A. 転記キー
B. 評価クラス
C. 評価領域
D. 材料タイプ
Answer: B

NEW QUESTION: 4

A. Option A
B. Option C
C. Option B
D. Option D
Answer: D


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